Mn2(CO)10 and UV light: a promising combination for regioselective alkene hydrosilylation at low temperature
Résumé
The low temperature regioselective hydrosilylation of various alkenes with (1,1,1,3,5,5,5-heptamethyltrisiloxane) MDHM is described using Mn2(CO)10 under UV radiation with Mn loadings as low as 1 mol%, in the absence of additives and with excellent selectivity and yields. The generation of manganese radical allowed to selectively obtain the anti-Markovnikov hydrosilylation products in yields up to 99%.
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