Journal Articles
Thin Solid Films
Year : 1999
Laurent Pichon : Connect in order to contact the contributor
https://hal.science/hal-03776563
Submitted on : Tuesday, September 13, 2022-8:55:21 PM
Last modification on : Wednesday, February 7, 2024-1:04:20 PM
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- HAL Id : hal-03776563 , version 1
- DOI : 10.1016/S0040-6090(98)01192-4
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B. Tala-Ighil, A. Rahal, K. Mourgues, A. Toutah, L. Pichon, et al.. State creation induced by gate bias stress in unhydrogenated polysilicon TFTs. Thin Solid Films, 1999, 337 (1-2), pp.101-104. ⟨10.1016/S0040-6090(98)01192-4⟩. ⟨hal-03776563⟩
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