Negative‐Index Acoustic Metamaterial Operating above 100 kHz in Water Using Microstructured Silicon Chips as Unit Cells
Jiaying Wang
(1)
,
Florian Allein
(2, 3)
,
Cécile Floer
(4)
,
Nicholas Boechler
(1)
,
James Friend
(1)
,
Oscar Vazquez-Mena
(1)
Jiaying Wang
- Fonction : Auteur
- PersonId : 1154309
- ORCID : 0000-0003-2749-8470
Florian Allein
- Fonction : Auteur
- PersonId : 751671
- IdHAL : florian-allein
- ORCID : 0000-0003-2425-5940
- IdRef : 204773350
Cécile Floer
- Fonction : Auteur
- PersonId : 1233936
- IdHAL : cecile-floer
- ORCID : 0000-0001-9228-1142
Oscar Vazquez-Mena
Connectez-vous pour contacter l'auteur
- Fonction : Auteur correspondant
- PersonId : 1154310
Connectez-vous pour contacter l'auteur
Résumé
A major challenge for negative-index acoustic metamaterials is increasing their operational frequency to the MHz range in water for applications such as biomedical ultrasound. Herein, a novel technology to realize acoustic metamaterials in water using microstructured silicon chips as unit cells that incorporate silicon nitride membranes and Helmholtz resonators with dimensions below 100 μm fabricated using clean-room microfabrication technology is presented. The silicon chip unit-cells are then assembled to form periodic structures that result in a negative-index metamaterial. Finite-element method (FEM) simulations of the metamaterial show a negative-index branch in the dispersion relation in the 0.25–0.35 MHz range. The metamaterial is characterized experimentally using laser-doppler vibrometry, showing opposite phase and group velocities, a signature of negative-index materials, and is in close agreement with FEM simulations. The experimental measurements also show that the magnitude of phase and group velocities increase as the frequency increases within the negative-index band, confirming the negative-index behavior of the material. Acoustic indices from –1 to –5 are reached with respect to water in the 0.25–0.35 MHz range. The use of silicon technology microfabrication to produce acoustic metamaterials for operation in water opens a new road to reach frequencies relevant for biomedical ultrasound applications.
Domaines
Sciences de l'ingénieur [physics]Format du dépôt | Notice |
---|---|
Type de dépôt | Article dans une revue |
Titre |
en
Negative‐Index Acoustic Metamaterial Operating above 100 kHz in Water Using Microstructured Silicon Chips as Unit Cells
|
Résumé |
en
A major challenge for negative-index acoustic metamaterials is increasing their operational frequency to the MHz range in water for applications such as biomedical ultrasound. Herein, a novel technology to realize acoustic metamaterials in water using microstructured silicon chips as unit cells that incorporate silicon nitride membranes and Helmholtz resonators with dimensions below 100 μm fabricated using clean-room microfabrication technology is presented. The silicon chip unit-cells are then assembled to form periodic structures that result in a negative-index metamaterial. Finite-element method (FEM) simulations of the metamaterial show a negative-index branch in the dispersion relation in the 0.25–0.35 MHz range. The metamaterial is characterized experimentally using laser-doppler vibrometry, showing opposite phase and group velocities, a signature of negative-index materials, and is in close agreement with FEM simulations. The experimental measurements also show that the magnitude of phase and group velocities increase as the frequency increases within the negative-index band, confirming the negative-index behavior of the material. Acoustic indices from –1 to –5 are reached with respect to water in the 0.25–0.35 MHz range. The use of silicon technology microfabrication to produce acoustic metamaterials for operation in water opens a new road to reach frequencies relevant for biomedical ultrasound applications.
|
Auteur(s) |
Jiaying Wang
1
, Florian Allein
2, 3
, Cécile Floer
4
, Nicholas Boechler
1
, James Friend
1
, Oscar Vazquez-Mena
1
1
UC San Diego -
University of California [San Diego]
( 300717 )
- UCSD, 9500 Gilman Dr., La Jolla, CA 92093 USA
- États-Unis
2
IEMN -
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520
( 1066983 )
- [Univ. Lille, CNRS, Centrale Lille Institut, Junia, Univ. Polytechnique Hauts-de-France] ––
Laboratoire Central – Cité Scientifique – Avenue Poincaré – CS 60069 – 59652 VILLENEUVE D’ASCQ CEDEX
- France
3
ACOUSTIQUE - IEMN -
Acoustique - IEMN
( 1067378 )
- Groupe Acoustique - (Acoustic Group) -
JUNIA - 41 Bd Vauban - 59800 LILLE
- France
4
IJL -
Institut Jean Lamour
( 104710 )
- Institut Jean Lamour - CNRS - Université de Lorraine. Campus Artem 2 allée André Guinier BP 50840 54011 Nancy Cedex
- France
|
Langue du document |
Anglais
|
Vulgarisation |
Non
|
Comité de lecture |
Oui
|
Audience |
Internationale
|
Nom de la revue |
|
Page/Identifiant |
2200407
|
Date de publication |
2022-12
|
Date de publication électronique |
2022-06-22
|
Volume |
7
|
Numéro |
12
|
Domaine(s) |
|
Financement |
|
Référence interne |
|
Mots-clés |
en
metamaterials, negative density, negative index, negative modulus, ultrasound
|
DOI | 10.1002/admt.202200407 |
Loading...