The negative temperature coefficient of the breakdown voltage of SiC p-n structures and deep centers in SiC - Archive ouverte HAL
Communication Dans Un Congrès Année : 1996

The negative temperature coefficient of the breakdown voltage of SiC p-n structures and deep centers in SiC

Résumé

In this paper negative temperature coefficient of the 6H-SiC diode breakdown voltage is considered. It is shown that the temperature dependence of the breakdown voltage value can be explained in terms of recharging of deep centers in the space charge region of the diode. Experiments made with boron doped 6H-SiC diodes are in good agreement with calculation.
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Dates et versions

hal-03712441 , version 1 (03-07-2022)

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  • HAL Id : hal-03712441 , version 1

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A A Lebedev, A M Strel'Chuk, S. Ortolland, Christophe Raynaud, Marie-Laure Locatelli, et al.. The negative temperature coefficient of the breakdown voltage of SiC p-n structures and deep centers in SiC. International Conference on Silicon Carbide and Related Materials ICSCRM'95, Sep 1995, Kyoto, Japan. ⟨hal-03712441⟩
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