Measurement of the sputtering yield with a 3d stylus surface mapping system: application to copper and α-brass - Archive ouverte HAL
Article Dans Une Revue Surface and Interface Analysis Année : 1986

Measurement of the sputtering yield with a 3d stylus surface mapping system: application to copper and α-brass

Résumé

This paper present a method for determing the sputtering yield of a material bombarded by an ion beam, using a 3D stylus surface mapping system. Data obtained of copper are discussed. The influences on the sputtering yield of progressive addition of zinc is observed. The results are in good agreement with previous theoretical results.

Dates et versions

hal-03660696 , version 1 (06-05-2022)

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Citer

Jean‐christophe Quantin, E. Darque-Ceretti, R. Combarieu, F. Delamare. Measurement of the sputtering yield with a 3d stylus surface mapping system: application to copper and α-brass. Surface and Interface Analysis, 1986, 9 (2), pp.125-128. ⟨10.1002/sia.740090208⟩. ⟨hal-03660696⟩
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