Conference Papers
Year : 2019
Collection IEMN : Connect in order to contact the contributor
https://hal.science/hal-03635045
Submitted on : Friday, April 8, 2022-10:43:07 AM
Last modification on : Wednesday, January 24, 2024-9:54:18 AM
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- HAL Id : hal-03635045 , version 1
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Arnaud Pageau, Garrett Curley, Pascal Tilmant, Francois Vaurette, Dmitri Yarekha. Study of Various PhotoResist for Bosch Process. Euronanolab Dry Etch Expert meeting, Dec 2019, Saclay, France. ⟨hal-03635045⟩
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