Dry etching at IEMN - Archive ouverte HAL Access content directly
Poster Communications Year : 2019
No file

Dates and versions

hal-03635035 , version 1 (08-04-2022)

Identifiers

  • HAL Id : hal-03635035 , version 1

Cite

Dmitri Yarekha. Dry etching at IEMN. Euronanolab Dry Etch Expert meeting, Dec 2019, Saclay, France. 2019. ⟨hal-03635035⟩
12 View
0 Download

Share

Gmail Facebook Twitter LinkedIn More