Investigations on the Diffusion of Oxygen in Nickel at 1000°C by SIMS Analysis - Archive ouverte HAL Access content directly
Journal Articles Journal of The Electrochemical Society Year : 2005

Investigations on the Diffusion of Oxygen in Nickel at 1000°C by SIMS Analysis

Abstract

High-purity polycrystalline nickel foils have been oxidized at 1000°C in laboratory air before being analyzed in secondary ion mass spectrometry to locally measure the oxygen content in solid solution. The values obtained in metallic grains are surprisingly the same before and after the oxidation treatments (between 5 and 10 atom ppm) and they are much lower than the ones predicted from the literature solubility and diffusion coefficient data at 1000°C. It is shown that this discrepancy could have its origins in the purity level of the samples but also in the exclusive oxygen diffusion in nickel grain boundaries. This last assumption is supported by the occurrence of nickel oxide particles on the walls of voids located in grain boundaries.
Fichier principal
Vignette du fichier
Perusin_2701.pdf (721.49 Ko) Télécharger le fichier
Origin : Files produced by the author(s)

Dates and versions

hal-03600387 , version 1 (07-03-2022)

Identifiers

Cite

Simon Perusin, Daniel Monceau, Eric Andrieu. Investigations on the Diffusion of Oxygen in Nickel at 1000°C by SIMS Analysis. Journal of The Electrochemical Society, 2005, 152 (12), pp.390-397. ⟨10.1149/1.2116787⟩. ⟨hal-03600387⟩
7 View
10 Download

Altmetric

Share

Gmail Facebook X LinkedIn More