Impact of area scaling on the ferroelectric properties of back-end of line compatible Hf 0.5 Zr 0.5 O 2 and Si:HfO 2 -based MFM capacitors
Résumé
Scaling of planar HfO2-based ferroelectric capacitors is investigated experimentally by varying the capacitor area within 5 orders of magnitude, under the scope of limited thermal budget for crystallization. Both Hf0.5Zr0.5O2 (HZO) and Si-doped HfO2 (HSO) based metal/ferroelectric/metal (MFM) capacitors with 10 nm dielectric film thickness and TiN electrodes are demonstrated to be ferroelectric when integrated in a back-end of line (BEOL) of 130 nm CMOS technology, with a maximum thermal budget below 500°C. When the area of the ferroelectric capacitors is scaled down from 7850 µm² to 0.28 µm², no degradation of the remanent polarization (2•PR > 10 µC/cm² for HSO, > 30 µC/cm² for HZO) or of the switching kinetics (down to 100 ns at 3V) is observed. Significant improvement of the field cycling endurance is demonstrated upon area scaling, consistent with the reduction of the total number of defects when devices are shrunk. The results pave the way to future BEOL demonstrations in 130 nm and more advanced nodes with record endurance similar to perovskite ferroelectrics.
Fichier principal
Francois, APL2021, Impact of area scaling on the ferroelectric properties of Back-End Of Line compatible Hf0.5Zr0.5O2 and SiHfO2-based MFM capacitors .pdf (550.77 Ko)
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