AFM and Raman Spectroscopy of fluorine doped tin oxide (FTO) thin films: A combined experimental study - Archive ouverte HAL
Communication Dans Un Congrès Année : 2021

AFM and Raman Spectroscopy of fluorine doped tin oxide (FTO) thin films: A combined experimental study

Christelle Habis
  • Fonction : Auteur
Patrice Bourson
  • Fonction : Auteur

Résumé

Thin films of fluorine doped tin oxide to be used as transparent electrical contacts for PV solar cells were deposited on glass substrate using ultrasonic spray pyrolysis technique. The films were grown at a temperature of 420°C. Structural analysis and characterization and morphological study of these films was carried out by Atomic Force Microscopy and Raman Spectrophotometer. Growth parameters such as carrier gas flow rate of the sprayed solution were found to have an influence on the grain size and roughness of the deposited films.
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Dates et versions

hal-03586974 , version 1 (24-02-2022)

Identifiants

Citer

Christelle Habis, Michel Aillerie, Patrice Bourson. AFM and Raman Spectroscopy of fluorine doped tin oxide (FTO) thin films: A combined experimental study. APPLIED PHYSICS OF CONDENSED MATTER (APCOM 2021), Jun 2021, Štrbske Pleso, Slovakia. pp.040003-1-040003-9, ⟨10.1063/5.0067056⟩. ⟨hal-03586974⟩
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