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Journal Articles Nanoscale Year : 2022

Ultra-clean high-mobility graphene on technologically relevant substrates

Vaidotas Mišeikis
Leonardo Martini
Stiven Forti
Neeraj Mishra
  • Function : Author
Zewdu Gebeyehu
Marco Giambra
  • Function : Author
Mathieu Frégnaux
Damien Aureau
Camilla Coletti

Abstract

2-step chemical cleaning allows enhanced removal of polymeric residues from the surface of graphene, leading to significantly improved electrical and morphological properties.
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Origin : Publication funded by an institution

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hal-03556278 , version 1 (02-06-2022)

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Attribution - NonCommercial

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Ayush Tyagi, Vaidotas Mišeikis, Leonardo Martini, Stiven Forti, Neeraj Mishra, et al.. Ultra-clean high-mobility graphene on technologically relevant substrates. Nanoscale, In press, ⟨10.1039/d1nr05904a⟩. ⟨hal-03556278⟩
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