Reactivity of Cr(CO)6 in atmospheric pressure CVD processes for the growth of various metallurgical coatings - Archive ouverte HAL Access content directly
Journal Articles Reviews on Advanced Materials Science Year : 2007

Reactivity of Cr(CO)6 in atmospheric pressure CVD processes for the growth of various metallurgical coatings

Abstract

Metalorganic precursors allow a significant decrease of the deposition temperature in CVD processes. When they are employed under atmospheric pressure and using direct liquid injection delivery systems, new processes can be developed for the growth of metallurgical coatings. However, even for a single precursor the great variety of reactive gas phase leads to various coatings with different properties. Original nanocrystalline CrCxOy and CrNxOy films were deposited in a laminar flow reactor by MOCVD and DLICVD using Cr(CO)6 as molecular precursor in the temperature range 285-450 °C. Pyrolysis was carried out in different ambient including N2, H2, NH3, THF, and toluene. The influence of the various atmosphere on the composition, structure and, consequently, mechanical properties and corrosion behavior of these coatings is discussed.

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Dates and versions

hal-03477964 , version 1 (13-12-2021)

Identifiers

  • HAL Id : hal-03477964 , version 1
  • OATAO : 2740

Cite

Aurélia Douard, Francis Maury, Jean-Baptiste Jorcin, Nadine Pébère, Jean-Pierre Bonino, et al.. Reactivity of Cr(CO)6 in atmospheric pressure CVD processes for the growth of various metallurgical coatings. Reviews on Advanced Materials Science, 2007, 15 (1), pp.24-32. ⟨hal-03477964⟩
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