Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Proc. SPIE 11612, Advances in Patterning Materials and Processes XXXVIII Année : 2021

Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications

Célia Nicolet
  • Fonction : Auteur
Christophe Navarro
  • Fonction : Auteur
Ian Cayrefourcq
  • Fonction : Auteur
Marcus Müller
Georges Hadziioannou
  • Fonction : Auteur
Ilias Iliopoulos
  • Fonction : Auteur
Guillaume Fleury
Cindy Gomez Correia
  • Fonction : Auteur

Résumé

Results for the self-assembly of lamellar silicon-containing high-χ BCPs with innovative neutral topcoat design are presented. We demonstrate that these materials and associated processes are compatible with a standard lithographic process, and oriented toward a potential HVM. We show that this dedicated technology is able to guarantee the stability and planarity of the stack even at elevated self-assembly bake temperatures, and opens new opportunity in the fields of 3D BCPs stacks. Finally, we show interesting results for the etch-transfer of a lamellar BCP in silicon.
Fichier principal
Vignette du fichier
Manuscript spie2021.pdf (1 Mo) Télécharger le fichier
Origine : Fichiers produits par l'(les) auteur(s)

Dates et versions

hal-03452942 , version 1 (13-12-2021)

Identifiants

Citer

Xavier Chevalier, Cindy Gomes Correia, Gwenaelle Pound-Lana, Philippe Bézard, Matthieu Sérégé, et al.. Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications. SPIE Advanced Lithography conference – Alternative Lithographic Technologies, Feb 2021, San Jose, USA, France. pp.26, ⟨10.1117/12.2583717⟩. ⟨hal-03452942⟩
22 Consultations
47 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More