Controlling the formation of high aspect ratio void channels inside glass is important for applications like the high-speed dicing of glass. Here, we investigate void formation using ultrafast Bessel beams in the single shot illumination regime. We characterize the morphology of the damages as a function of pulse energy, pulse duration, and position of the beam inside fused silica, Corning Eagle XG, and Corning Gorilla glass. While a large set of parameters allow for void formation inside fused silica, the operating window is much more restricted for Eagle XG and Gorilla glass. The transient formation of a molten layer around voids enables us interpreting the evolution of the morphology with pulse energy and duration.