Mass transport evolution in microfluidic thin film electrochemical reactors: New correlations from millimetric to submillimetric interelectrode distances
Résumé
Correlation of the mass transfer characteristics of microfluidic parallel-plate electrochemical reactors is proposed for the first time. Firstly, the variation in the mass transfer coefficient (k m) (1.61-3.94 × 10 − 5 m s − 1) over a wide range of interelectrode distances (d elec) from millimetric (3 mm) to micrometric values (100 µm) is reported. Secondly, a drastic slope change in the curve makes it possible to identify the onset of microfluidic behavior in a quantitative way for the first time, i.e. below a 1000 µm gap. Thirdly, a mathematical model is proposed which predicts k m for any d elec of interest. Fourthly, under laminar flow (7 < Reynolds (Re) < 623) and for temperatures in the range of 10-50 • C (532 < Schmidt (Sc) < 3315), new Sherwood (Sh) correlations are obtained for both microfluidic and millimetric configurations. It is thus feasible to extrapolate k m for microfluidic electrochemical reactor scale-up.
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