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Article Dans Une Revue Electrochemistry Communications Année : 2021

Mass transport evolution in microfluidic thin film electrochemical reactors: New correlations from millimetric to submillimetric interelectrode distances

Résumé

Correlation of the mass transfer characteristics of microfluidic parallel-plate electrochemical reactors is proposed for the first time. Firstly, the variation in the mass transfer coefficient (k m) (1.61-3.94 × 10 − 5 m s − 1) over a wide range of interelectrode distances (d elec) from millimetric (3 mm) to micrometric values (100 µm) is reported. Secondly, a drastic slope change in the curve makes it possible to identify the onset of microfluidic behavior in a quantitative way for the first time, i.e. below a 1000 µm gap. Thirdly, a mathematical model is proposed which predicts k m for any d elec of interest. Fourthly, under laminar flow (7 < Reynolds (Re) < 623) and for temperatures in the range of 10-50 • C (532 < Schmidt (Sc) < 3315), new Sherwood (Sh) correlations are obtained for both microfluidic and millimetric configurations. It is thus feasible to extrapolate k m for microfluidic electrochemical reactor scale-up.
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hal-03429825 , version 1 (15-11-2021)

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Paternité - Pas d'utilisation commerciale - Pas de modification

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Faidzul Hakim Adnan, Marie-Noëlle Pons, Emmanuel Mousset. Mass transport evolution in microfluidic thin film electrochemical reactors: New correlations from millimetric to submillimetric interelectrode distances. Electrochemistry Communications, 2021, 130, pp.107097. ⟨10.1016/j.elecom.2021.107097⟩. ⟨hal-03429825⟩
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