1550 nm InAs QD on InP for VECSEL and MECSEL applications - Archive ouverte HAL
Communication Dans Un Congrès Année : 2021

1550 nm InAs QD on InP for VECSEL and MECSEL applications

Résumé

We report on the growth optimization of 1550 nm InAs QD grown on InP substrates used as gain medium within Vertical or Membrane External Cavity Surface Emitting Lasers (VECSEL and MECSEL). High gain structures have been successfully realized. Laser operation at 1520 nm and at room temperature is obtained, high output power (2.2 W) and large wavelength tuning (86 nm) are demonstrated.

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Dates et versions

hal-03413020 , version 1 (04-11-2021)

Identifiants

  • HAL Id : hal-03413020 , version 1

Citer

Cyril Paranthoen, Hoy-My Phung, Anwar Kerchaoui, Alexandru Mereuta, Christophe Levallois, et al.. 1550 nm InAs QD on InP for VECSEL and MECSEL applications. Compound Semicondcutor Week 2021 (CSW 2021), May 2021, Stockholm (online), Sweden. ⟨hal-03413020⟩
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