Comparison of alignment markers and method for electron-beam lithography on CMOS dies. - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2021
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hal-03364705 , version 1 (04-10-2021)

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R Dawant, S Ecoffey, R Seils, R Schmid, D. Drouin. Comparison of alignment markers and method for electron-beam lithography on CMOS dies.. The 64th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication - EIPBN, Jun 2021, On Line, France. ⟨hal-03364705⟩
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