Sub-nanometer atomic layer deposited Al2O3 barrier layer for improving stability of nonfullerene organic solar cells - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Organic Electronics Année : 2021

Sub-nanometer atomic layer deposited Al2O3 barrier layer for improving stability of nonfullerene organic solar cells

Fichier non déposé

Dates et versions

hal-03359298 , version 1 (30-09-2021)

Identifiants

Citer

Shiwei Wu, Yanglin Zhao, Chi Wang, Shang Li, Renaud Bachelot, et al.. Sub-nanometer atomic layer deposited Al2O3 barrier layer for improving stability of nonfullerene organic solar cells. Organic Electronics, 2021, 99, pp.106351. ⟨10.1016/j.orgel.2021.106351⟩. ⟨hal-03359298⟩
43 Consultations
0 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More