Metal/insulator/semiconductor contacts for ultimately scaled CMOS nodes: projected benefits and remaining challenges - Archive ouverte HAL
Communication Dans Un Congrès Année : 2016

Metal/insulator/semiconductor contacts for ultimately scaled CMOS nodes: projected benefits and remaining challenges

Résumé

In this paper, some key fundamental aspects of Metal / Insulator / Semiconductor contacts as well as practical issues occurring with their implementation are reviewed in order to fully comprehend the opportunities and limitations of this approach.
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Dates et versions

hal-03325000 , version 1 (24-08-2021)

Identifiants

  • HAL Id : hal-03325000 , version 1

Citer

Julien Borrel, Louis Hutin, Helen Grampeix, Emmanuel Nolot, Magali Tessaire, et al.. Metal/insulator/semiconductor contacts for ultimately scaled CMOS nodes: projected benefits and remaining challenges. IWJT 2016 - 16th International Workshop on Junction Technology, May 2016, Shanghai, China. pp.14-19. ⟨hal-03325000⟩
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