Streaming and removal forces due to second-order sound field during megasonic cleaning of silicon wafers - Archive ouverte HAL
Article Dans Une Revue Journal of Applied Physics Année : 2000

Streaming and removal forces due to second-order sound field during megasonic cleaning of silicon wafers

Fichier non déposé

Dates et versions

hal-03301993 , version 1 (27-07-2021)

Identifiants

Citer

Jerome O. Vasseur, P. Deymier, J. Vasseur, A. Khelif, Bahram Djafari-Rouhani, et al.. Streaming and removal forces due to second-order sound field during megasonic cleaning of silicon wafers. Journal of Applied Physics, 2000, 88 (11), pp.6821-6835. ⟨10.1063/1.1323521⟩. ⟨hal-03301993⟩
16 Consultations
0 Téléchargements

Altmetric

Partager

More