Power performance at 40 GHz of AlGaN/GaN high electron mobility transistors grown by molecular beam epitaxy on Si(111) substrate
Résumé
This letter reports on the demonstration of microwave power performance at 40 GHz on AlGaN/GaN high-electron mobility transistor grown on silicon (111) substrate by molecular beam epitaxy. A maximum dc current density of 1.1 A.mm(-1) and a peak extrinsic transconductance of 374 mS.mm(-1) are obtained for 75-nm gate length device. At V-DS = 25 V, continuous-wave output power density of 2.7 W.mm(-1) is achieved at 40 GHz associated with 12.5% power-added efficiency and a linear power gain (G(p)) of 6.5 dB. The device exhibits an intrinsic current gain cutoff frequency F-T of 116 GHz and a maximum oscillation frequency F-MAX of 150 GHz. This performance demonstrates the capability of low cost microwave power devices up to Ka-band.