RF Performance of Devices Processed in Low-Temperature Sequential Integration - Archive ouverte HAL
Article Dans Une Revue IEEE Transactions on Electron Devices Année : 2021

RF Performance of Devices Processed in Low-Temperature Sequential Integration

Fichier non déposé

Dates et versions

hal-03260955 , version 1 (15-06-2021)

Identifiants

Citer

T. Mota Frutuoso, P. Sideris, J. Lugo-Alvarez, X. Garros, L. Brunet, et al.. RF Performance of Devices Processed in Low-Temperature Sequential Integration. IEEE Transactions on Electron Devices, 2021, pp.1-6. ⟨10.1109/TED.2021.3080669⟩. ⟨hal-03260955⟩
57 Consultations
0 Téléchargements

Altmetric

Partager

More