Structural and functional properties of Al:ZnO thin films grown by Pulsed Laser Deposition at room temperature - Archive ouverte HAL
Article Dans Une Revue Thin Solid Films Année : 2012

Structural and functional properties of Al:ZnO thin films grown by Pulsed Laser Deposition at room temperature

Résumé

Current research on transparent conductive oxides (TCOs) is focusing on indium-free TCOs, such as Al-doped ZnO (AZO), as an alternative to indium–tin oxide. In this work, AZO thin films were grown by Pulsed Laser Deposition at room temperature in oxygen atmosphere. The O2 pressure was varied from 0.01 Pa to 10 Pa, highlighting the effects of defect formation and oxygen vacancies on the film properties. Structural properties were characterized by X-ray diffraction and Scanning Electron Microscopy, while functional properties were characterized by measurement of electrical conductivity, Hall mobility, carrier density and optical transmission. At an optimal deposition pressure of 2 Pa, optical transparency in the visible range and minimum resistivity (4.5 ∙ 10− 4 Ω cm) were found, comparable to state-of-the-art TCOs. Mean value of visible transparency was shown to increase with increasing pressure, up to 88% at a deposition pressure of 10 Pa.
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Dates et versions

hal-03255240 , version 1 (09-06-2021)

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Paolo Gondoni, Matteo Ghidelli, Fabio Di Fonzo, Valeria Russo, Paola Bruno, et al.. Structural and functional properties of Al:ZnO thin films grown by Pulsed Laser Deposition at room temperature. Thin Solid Films, 2012, 520 (14), pp.4707-4711. ⟨10.1016/j.tsf.2011.10.072⟩. ⟨hal-03255240⟩
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