Gallium nitride MEMS resonators: how residual stress impacts design and performances - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Microsystem Technologies Année : 2018

Gallium nitride MEMS resonators: how residual stress impacts design and performances

Joff Derluyn
  • Fonction : Auteur
Stefan Degroote
Marianne Germain
  • Fonction : Auteur

Résumé

Starting from Gallium Nitride epitaxially grown on silicon, pre-stressed micro-resonators with integrated piezoelectric transducers have been designed, fabricated, and characterized. In clamped-clamped beams, it is well known that tensile stress can be used to increase the resonant frequency. Here we calculate the mode shape functions of out-of-plane flexural modes in pre-stressed beams and we derive a model to predict both the resonant frequency and the piezoelectric actuation factor. We show that a good agreement between theory and experimental results can be obtained and we derive the optimal design for the electromechanical transduction. Finally, our model predicts an increase of the quality factor due to the tensile stress, which is confirmed by experimental measurements under vacuum. This study demonstrates how to take advantage from the material quality and initial stress resulting of the epitaxial process.
Fichier principal
Vignette du fichier
Microsystem technologies sub_final v4.pdf (733.29 Ko) Télécharger le fichier
Origine : Fichiers produits par l'(les) auteur(s)

Dates et versions

hal-03183510 , version 1 (14-08-2021)

Identifiants

Citer

Christophe Morelle, Didier Theron, Joff Derluyn, Stefan Degroote, Marianne Germain, et al.. Gallium nitride MEMS resonators: how residual stress impacts design and performances. Microsystem Technologies, 2018, 24 (1), pp.371-377. ⟨10.1007/s00542-017-3293-0⟩. ⟨hal-03183510⟩
43 Consultations
101 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More