Design Optimization of Through-Silicon Vias for Substrate-Integrated Waveguides embedded in High-Resistive Silicon Interposer - Archive ouverte HAL
Communication Dans Un Congrès Année : 2018

Design Optimization of Through-Silicon Vias for Substrate-Integrated Waveguides embedded in High-Resistive Silicon Interposer

Résumé

In this work, the optimization of TSVs for SIWs embedded in a high-resistive silicon interposer is demonstrated. EM simulations are performed to analyze and optimize important TSV design parameters enabling silicon interposer technologies with low-loss SIWs working at mm-wave/THz frequencies. A silicon interposer using high resistive silicon and TSVs is fabricated and SIWs are characterized working from 110-170 GHz with very low attenuation of ~0.5 dB/mm.
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hal-03158256 , version 1 (03-03-2021)

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  • HAL Id : hal-03158256 , version 1

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Matthias Wietstruck, Steffen Marschmeyer, Selin Tolunay Wipf, Christian Wipf, T. Voβ, et al.. Design Optimization of Through-Silicon Vias for Substrate-Integrated Waveguides embedded in High-Resistive Silicon Interposer. 20th Electronics Packaging Technology Conference (EPTC 2018), Dec 2018, Singapore, Singapore. ⟨hal-03158256⟩
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