Superconducting Polycrystalline Silicon Layer Obtained by Boron Implantation and Nanosecond Laser Annealing - Archive ouverte HAL
Article Dans Une Revue ECS Journal of Solid State Science and Technology Année : 2021

Superconducting Polycrystalline Silicon Layer Obtained by Boron Implantation and Nanosecond Laser Annealing

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hal-03121810 , version 1 (26-01-2021)

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R. Daubriac, P. Acosta Alba, C. Marcenat, S. Lequien, T. Vethaak, et al.. Superconducting Polycrystalline Silicon Layer Obtained by Boron Implantation and Nanosecond Laser Annealing. ECS Journal of Solid State Science and Technology, 2021, 10 (1), pp.014004. ⟨10.1149/2162-8777/abdc41⟩. ⟨hal-03121810⟩
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