Investigation of resistive switching and transport mechanisms of Al <sub>2</sub>O<sub>3</sub>/TiO<sub>2−<i>x</i></sub> memristors under cryogenic conditions (1.5 K) - Archive ouverte HAL
Article Dans Une Revue AIP Advances Année : 2020

Investigation of resistive switching and transport mechanisms of Al 2O3/TiO2−x memristors under cryogenic conditions (1.5 K)

Résumé

Resistive switching and transport mechanisms of Al2O3/TiO2−x memristor crosspoint devices have been investigated at cryogenic temperatures down to 1.5 K, for the future development of memristor-based cryogenic electronics. We report successful resistive switching of our devices in the temperature range of 300–1.5 K. The current–voltage curves exhibit negative differential resistance effects between 130 K and 1.5 K, attributed to a metal–insulator transition of the Ti4O7 conductive filament. The resulting highly nonlinear behavior is associated with an ION/IOFF diode ratio of 84 at 1.5 K, paving the way for selector-free cryogenic passive crossbars. Temperature-dependent thermal activation energies related to the conductance at low bias (20 mV) are extracted for memristors in a low resistance state, suggesting hopping-type conduction mechanisms. Finally, the transport mechanism analysis at 1.5 K indicates that for all resistance states, the conduction follows the space-charge limited current model in low fields, whereas trap-assisted tunneling dominates in higher fields.
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Dates et versions

hal-03095333 , version 1 (08-07-2022)

Identifiants

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Yann Beilliard, François Paquette, Frédéric Brousseau, Serge Ecoffey, F. Alibart, et al.. Investigation of resistive switching and transport mechanisms of Al 2O3/TiO2−x memristors under cryogenic conditions (1.5 K). AIP Advances, 2020, 10 (2), pp.025305. ⟨10.1063/1.5140994⟩. ⟨hal-03095333⟩
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