Method for eliminating microorganisms present in and/or at the surface of a material to be decontaminated
Résumé
The present invention concems a method for eliminating microorganisms present in and/or at the surface of a material to be decontaminated comprising a step of irradiating said material to be decontaminated with radiation consisting of at least two light beams a1and a2 directed onto said material, the two light beams a1 and a2 respectively having a wavelength λ1 and λ2 of between 380 and 420nm.