Photoassisted chemical smoothing of AlGaN surface after laser lift-off - Archive ouverte HAL Access content directly
Journal Articles Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics Year : 2020
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hal-02931570 , version 1 (07-09-2020)

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Zhongming Zheng, Hao Long, Samuel Matta, Mathieu Leroux, Julien Brault, et al.. Photoassisted chemical smoothing of AlGaN surface after laser lift-off. Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics, 2020, 38 (4), pp.042207. ⟨10.1116/6.0000192⟩. ⟨hal-02931570⟩
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