Interdiffusion behaviors observation in TiN/ZrO N bilayer by XAS and ToF-SIMS
Abstract
Interface behavior plays an important role in multilayer structure. The deep understanding of interface diffusion and reaction is necessary to improve the performance of device with multilayer structure. In the present work, we perform a detailed systematic study on interdiffusion and interaction between the TiN and ZrO x N y layers in the TiN/ZrO x N y bilayer system. A series of TiN/ZrO x N y bilayers with reverse deposition orders or with varied composition have been prepared by radio-frequency reactive magnetron sputtering. Synchrotron radiation x-ray absorption spectroscopy (XAS) and time of flight secondary ion mass spectrometry (ToF-SIMS) are both used to understand well interface diffusion behavior. The XAS results indicate that interaction and interdiffusion extent between TiN and ZrO 2
Domains
Other [cond-mat.other]| Origin | Files produced by the author(s) |
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