Charged Particle Dynamics in Technological Radio Frequency Plasmas Operated in CF<SUB>4</SUB> - Archive ouverte HAL
Communication Dans Un Congrès Année : 2016

Charged Particle Dynamics in Technological Radio Frequency Plasmas Operated in CF4

J. Schulze
  • Fonction : Auteur
B. Berger
  • Fonction : Auteur
S. Brandt
  • Fonction : Auteur
Bastien Bruneau
  • Fonction : Auteur
Y. Liu
Ihor Korolov
  • Fonction : Auteur
A. Derzsi
  • Fonction : Auteur
E. Schuengel
  • Fonction : Auteur
M. Koepke
  • Fonction : Auteur
T. Mussenbrock
  • Fonction : Auteur
E.V. Johnson
Trevor Lafleur
Jean-Paul Booth
D. O'Connell
  • Fonction : Auteur
T. Gans
  • Fonction : Auteur
Yn Wang
  • Fonction : Auteur
Z. Donkó
  • Fonction : Auteur

Résumé

ion energy distribution functions (IEDF) are investigated in electronegative capacitive RF plasmas operated in CF4 based on a combination of experiments, PIC simulations, and models. In the experiment, Phase Resolved Optical Emission Spectroscopy is used to access the space and time resolved electron dynamics. The DC self bias and IEDFs are measured at the electrodes. For a single frequency discharge operated at 13.56 MHz and 80 Pa we demonstrate that the presence of an electronegative gas can change the electron power absorption dynamics completely compared to electropositive gases by inducing a heating mode transition. Reducing the driving frequency results in the formation of stable striations of the optical emission and electron impact excitation rate due to the collective response of positive and negative ions to the driving frequency. Based on this fundamental understanding, we show that tailoring the driving voltage waveform using a superposition of multiple consecutive harmonics of a fundamental frequency with individually adjustable harmonics’ amplitudes and phases allows for control of the DC self bias, the shape and mean energy of the IEDF, the electron power absorption dynamics, and the spatial division of the discharge into two halves of strongly different electronegativity.
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Dates et versions

hal-02573358 , version 1 (14-05-2020)

Identifiants

  • HAL Id : hal-02573358 , version 1

Citer

J. Schulze, B. Berger, S. Brandt, Bastien Bruneau, Y. Liu, et al.. Charged Particle Dynamics in Technological Radio Frequency Plasmas Operated in CF4. AVS Symposium, Nov 2016, Nashville, United States. ⟨hal-02573358⟩
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