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Communication Dans Un Congrès Année : 2012

Plasma Excitation using Tailored Voltage Waveforms for the Deposition of Thin Film Silicon for Photovoltaics: From Plasma Physics to Devices

E.V. Johnson
Trevor Lafleur
Jean-Paul Booth
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hal-02573298 , version 1 (14-05-2020)

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  • HAL Id : hal-02573298 , version 1

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E.V. Johnson, Pierre-Alexandre Delattre, Trevor Lafleur, Jean-Paul Booth. Plasma Excitation using Tailored Voltage Waveforms for the Deposition of Thin Film Silicon for Photovoltaics: From Plasma Physics to Devices. 5th International Symposium on Atomically Controlled, Oct 2012, Osaka, Japan. ⟨hal-02573298⟩
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