Interaction Mechanisms Between Ar–O2 Post-Discharge and Stearic Acid II: Behaviour of Thick Films - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Plasma Chemistry and Plasma Processing Année : 2011

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hal-02447132 , version 1 (21-01-2020)

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E. Bernardelli, T. Belmonte, D. Duday, G. Frache, Fabienne Poncin-Epaillard, et al.. Interaction Mechanisms Between Ar–O2 Post-Discharge and Stearic Acid II: Behaviour of Thick Films. Plasma Chemistry and Plasma Processing, 2011, 31 (1), pp.205-215. ⟨10.1007/s11090-010-9264-1⟩. ⟨hal-02447132⟩
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