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Pré-Publication, Document De Travail Année : 2020

Surface Conditioning Effect on Vacuum Microelectronics Components Fabricated by Deep Reactive Ion Etching

Résumé

Advances in material processing such as silicon micromachining are opening the way to vacuum microelectronics. Two-dimensional vacuum components can be fabricated using the microsystems processes. We developed such devices using a single metal layer and silicon micromachining by DRIE. The latter technological step has significant impact on the characteristics of the vacuum components. This paper presents a brief summary of electron emission possibilities and the design leading to the fabrication of a lateral field emission diode. First measurement results and the aging of the devices are also discussed.

Dates et versions

hal-02437467 , version 1 (13-01-2020)

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Alain Phommahaxay, Gaelle Bazin Lissorgues, Lionel Rousseau, Tarik Bourouina, Pierre Nicole. Surface Conditioning Effect on Vacuum Microelectronics Components Fabricated by Deep Reactive Ion Etching. 2020. ⟨hal-02437467⟩
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