Behaviour of two products containing film forming amines (FFA) in the secondary circuit physico-chemical conditions of the pressurized water reactor (PWR) - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2018

Behaviour of two products containing film forming amines (FFA) in the secondary circuit physico-chemical conditions of the pressurized water reactor (PWR)

R. Lecocq
  • Fonction : Auteur
L. Verelst
  • Fonction : Auteur
S. Delaunay
  • Fonction : Auteur
J. Tireau
  • Fonction : Auteur

Résumé

The use of FFA seems to be an effective way to protect the main parts of the water/steam cycle against corrosion during the shutdown periods. Numerous start/stop operations and difficulties to plan downtime periods make FFA an interesting way to protect the secondary system. With injection of a FFA before the shutdown, most of the internal surfaces should be covered with a hydrophobic protective layer. However, organic substances such as FFA are susceptible to thermal degradation at high temperatures. A study of the potential formation of degradation products and their impact on the physical parameters in the secondary circuit was performed. The studied products are a mixture of FFA without other alkalizing amine compounds, reducing agents or dispersants. The first one contains mainly the octadecylamine (ODA) and the second one mainly contains oleyl propylenediamine (OLDA). For each product, two tests with different residence times were performed at 280 DC in one phase flow. Gas chromatography-mass spectrometry analysis and Fourier transform infrared spectroscopy by attenuated total reflection (ATR-FTIR) were carried out to identify the organic products formed at high temperature. UV-visible spectroscopy was used to evaluate the stability of the FFA. The behavior of the two FFA mixtures were compared.

Mots clés

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Dates et versions

hal-02415314 , version 1 (17-12-2019)

Identifiants

  • HAL Id : hal-02415314 , version 1

Citer

M. Roy, D. You, R. Lecocq, L. Verelst, S. Delaunay, et al.. Behaviour of two products containing film forming amines (FFA) in the secondary circuit physico-chemical conditions of the pressurized water reactor (PWR). The Second International Conference on Film FormingAmines and Products (FFP 2018), Mar 2018, Prague, Czech Republic. ⟨hal-02415314⟩
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