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Communication Dans Un Congrès Année : 2019

Influence of low temperature annealing on Nickel RTDs designed for heat flux sensing

Résumé

In this paper, we study the influence of annealing on the performance of Resistive Temperature Detectors made from Nickel thin films. The aimed application is heat flux sensing. The substrate is made of Borofloat glass with a Chromium adhesive layer. Several annealing temperatures between 150°C and 300°C are applied to this assembly. The thin films as deposited and after annealing are analyzed through SEM images. The evolution of the resistance and the temperature coefficient of the sensor are discussed. An annealing temperature is selected that ensures the repeatability of measurements.
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Dates et versions

hal-02366775 , version 1 (16-11-2019)

Identifiants

  • HAL Id : hal-02366775 , version 1

Citer

Youssef Mokadem, Sylvie Bégot, François Lanzetta, Jean Rauch, Aymen Zribi, et al.. Influence of low temperature annealing on Nickel RTDs designed for heat flux sensing. International Metrology Congress, Sep 2019, Paris, France. ⟨hal-02366775⟩
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