On the Mechanism of In Nanoparticle Formation by Exposing ITO Thin Films to Hydrogen Plasmas - Archive ouverte HAL
Article Dans Une Revue Langmuir Année : 2017

On the Mechanism of In Nanoparticle Formation by Exposing ITO Thin Films to Hydrogen Plasmas

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hal-02349142 , version 1 (05-11-2019)

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Zheng Fan, Jean-Luc Maurice, Wanghua Chen, Stephane Guilet, Edmond Cambril, et al.. On the Mechanism of In Nanoparticle Formation by Exposing ITO Thin Films to Hydrogen Plasmas. Langmuir, 2017, 33 (43), pp.12114-12119. ⟨10.1021/acs.langmuir.7b01743⟩. ⟨hal-02349142⟩
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