A user-friendly guide to the optimum ultraviolet photolithographic exposure and greyscale dose of SU-8 photoresist on common MEMS, microsystems, and microelectronics coatings and materials - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Analytical Methods Année : 2017

A user-friendly guide to the optimum ultraviolet photolithographic exposure and greyscale dose of SU-8 photoresist on common MEMS, microsystems, and microelectronics coatings and materials

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hal-02345405 , version 1 (04-11-2019)

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Matthieu Gaudet, S. Arscott. A user-friendly guide to the optimum ultraviolet photolithographic exposure and greyscale dose of SU-8 photoresist on common MEMS, microsystems, and microelectronics coatings and materials. Analytical Methods, 2017, 9 (17), pp.2495-2504. ⟨10.1039/C7AY00564D⟩. ⟨hal-02345405⟩
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