Progress in OCT-based Through Silicon Via (TSV) metrology - Archive ouverte HAL
Proceedings/Recueil Des Communications Année : 2019

Progress in OCT-based Through Silicon Via (TSV) metrology

Résumé

We report on progress in Time-Domain OCT (optical coherence tomography) applied to TSV (vertical interconnect accesses in silicon, enabling stacking of devices). Transitioning from the common scalar approach to an electromagnetic one, and combining it with a damped least squares approach, we enhance the accuracy of TSV height measurements.
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Dates et versions

hal-02343398 , version 1 (02-11-2019)

Identifiants

Citer

W. A. Iff, Christophe Sauvan, J-P. Hugonin, M. Besbes, P. Chavel, et al.. Progress in OCT-based Through Silicon Via (TSV) metrology. Frontiers in Optics, OSA Technical Digest, paper JW4A.115, 2019, ⟨10.1364/FIO.2019.JW4A.115⟩. ⟨hal-02343398⟩
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