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Year : 2017
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https://hal.science/hal-02338425
Submitted on : Wednesday, October 30, 2019-2:00:27 AM
Last modification on : Monday, November 17, 2025-8:42:03 AM
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- HAL Id : hal-02338425 , version 1
- DOI : 10.1016/B978-1-78548-096-6.50003-1
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Sebastien Barnola, Nicolas Posseme, Stefan Landis, Maxime Darnon. Patterning Challenges in Microelectronics. Plasma Etching Processes for CMOS Devices Realization, Elsevier, pp.59-94, 2017, ⟨10.1016/B978-1-78548-096-6.50003-1⟩. ⟨hal-02338425⟩
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