Book Sections Year : 2017
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hal-02338425 , version 1 (30-10-2019)

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Sebastien Barnola, Nicolas Posseme, Stefan Landis, Maxime Darnon. Patterning Challenges in Microelectronics. Plasma Etching Processes for CMOS Devices Realization, Elsevier, pp.59-94, 2017, ⟨10.1016/B978-1-78548-096-6.50003-1⟩. ⟨hal-02338425⟩
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