Halide perovskite high-k field-effect transistors with dynamically reconfigurable ambipolarity - Archive ouverte HAL
Article Dans Une Revue ACS Materials Letters Année : 2019

Halide perovskite high-k field-effect transistors with dynamically reconfigurable ambipolarity

Nicolò Zagni
Sergei Tretiak
Claudine Katan
Jean-Christophe Blancon

Résumé

Despite the remarkable optoelectronic properties of halide perovskites, achieving reproducible field effect transistor (FET) action in polycrystalline films at room temperature has been challenging and represents a fundamental bottleneck for understanding electronic charge transport in these materials. In this work, we report halide perovskite-based FET operation at room temperature with negligible hysteresis. Extensive measurements and device modeling reveal that incorporating high-k dielectrics enables modulation of the channel conductance. Furthermore, continuous bias cycling or resting allows dynamical reconfiguration of the FETs between p-type behavior and ambipolar FET with balanced electron and hole transport and an ON/OFF ratio up to 104 and negligible degradation in transport characteristics over 100 cycles. These results elucidate the path for achieving gate modulation in perovskite thin-films and provide a platform to understand the interplay between the perovskite structure, and external stimuli such as photons, fields and functional substrates, which will lead to novel and emergent properties.
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Dates et versions

hal-02338097 , version 1 (03-07-2024)

Identifiants

Citer

Noelia Devesa Canicoba, Nicolò Zagni, Fangze Liu, Gary Mccuistian, Kasun Fernando, et al.. Halide perovskite high-k field-effect transistors with dynamically reconfigurable ambipolarity. ACS Materials Letters, 2019, 1 (6), pp.633-640. ⟨10.1021/acsmaterialslett.9b00357⟩. ⟨hal-02338097⟩
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