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Communication Dans Un Congrès Année : 2016

Enhanced absorption and plasmon excitation in the bulk of fused silica with femtosecond Bessel beams

Vytautas Jukna
  • Fonction : Auteur
Arnaud Couairon

Résumé

We image femtosecond Bessel beam propagation in fused silica under ablation conditions, and observe unexpectedly high absorption. We identify plasmon excitation and plasma channel field enhancement as the likely mechanism for this increased absorption.
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Dates et versions

hal-02300650 , version 1 (29-09-2019)

Identifiants

  • HAL Id : hal-02300650 , version 1

Citer

Chen Xie, Remo Giust, Jinggui Zhang, Vytautas Jukna, Rémi Meyer, et al.. Enhanced absorption and plasmon excitation in the bulk of fused silica with femtosecond Bessel beams. Conference on Lasers and Electro-Optics, Jun 2016, San Jose, United States. ⟨hal-02300650⟩
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