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Communication Dans Un Congrès Année : 2019

Nanochannel formation by double pulse illumination with femtosecond Bessel beams

Résumé

We report high aspect ratio nanochannel fabrication in glass using single-shot femtosecond Bessel beams of sub-3 μJ pulse energies at 800 nm. We obtain near-parallel nanochannels with diameters in the range 200–800 nm, and aspect ratios that can exceed 100. An array of 230 nm diameter channels with 1.6 μm pitch illustrates the reproducibility of this approach and the potential for writing periodic structures. We also report proof-of-principle machining of a through-channel of 400 nm diameter in a 43 μm thick membrane. These results represent a significant advance of femtosecond laser ablation technology into the nanometric regime.
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Dates et versions

hal-02300624 , version 1 (29-09-2019)

Identifiants

  • HAL Id : hal-02300624 , version 1

Citer

Jesus del Hoyo, Rémi Meyer, Remo Giust, Luca Furfaro, Cyril Billet, et al.. Nanochannel formation by double pulse illumination with femtosecond Bessel beams. SPIE Photonics West, Feb 2019, San Francisco, United States. ⟨hal-02300624⟩
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