Study of the surface mechanisms in an Ar–N2 post-discharge cleaning process - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Surface and Coatings Technology Année : 2003

Study of the surface mechanisms in an Ar–N2 post-discharge cleaning process

Résumé

The purpose of the present investigation is to gain understanding of the mechanisms responsible for the cleaning properties of Ar–N2 post-discharges at room temperature. The evolution of the gas-phase composition is monitored by optical emission spectroscopy, and X-ray photoelectron spectroscopy is used to characterize the surface of iron samples initially covered by a contamination layer at various treatment times. Both techniques suggest that cleaning is at least a two-step process, beginning with the removal of aliphatic carbon from the surface.

Dates et versions

hal-02190571 , version 1 (22-07-2019)

Identifiants

Citer

David Mézerette, Thierry Belmonte, Robert Hugon, Gérard Henrion, Thierry Czerwiec, et al.. Study of the surface mechanisms in an Ar–N2 post-discharge cleaning process. Surface and Coatings Technology, 2003, 169-170, pp.181-185. ⟨10.1016/S0257-8972(03)00041-0⟩. ⟨hal-02190571⟩
14 Consultations
0 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More