Diamond thin film growth by pulsed microwave plasma at high power density in a CH4–H2 gas mixture - Archive ouverte HAL
Article Dans Une Revue Surface and Coatings Technology Année : 2003

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hal-02190570 , version 1 (22-07-2019)

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T. Lamara, M. Belmahi, J. Bougdira, F. Bénédic, G. Henrion, et al.. Diamond thin film growth by pulsed microwave plasma at high power density in a CH4–H2 gas mixture. Surface and Coatings Technology, 2003, 174-175, pp.784-789. ⟨10.1016/S0257-8972(03)00585-1⟩. ⟨hal-02190570⟩
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