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Article Dans Une Revue Journal of Thermal Spray Technology Année : 2011

Nonequilibrium Atmospheric Plasma Deposition

T. Belmonte
G. Henrion
T. Gries

Résumé

This study is a review of plasma enhanced chemical vapor deposition (PECVD) at atmospheric pressure. Sources for coatings over large area are presented. Millimetric torches and microplasmas are next studied for localized PECVD. A specific attention is paid to the way power is dissipated and the consequences it has on the deposition rate and on quality of thin films.

Dates et versions

hal-02190527 , version 1 (22-07-2019)

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T. Belmonte, G. Henrion, T. Gries. Nonequilibrium Atmospheric Plasma Deposition. Journal of Thermal Spray Technology, 2011, 20 (4), pp.744-759. ⟨10.1007/s11666-011-9642-0⟩. ⟨hal-02190527⟩
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