DSA-aware multiple patterning for the manufacturing of vias: Connections to graph coloring problems, IP formulations, and numerical experiments - Archive ouverte HAL Accéder directement au contenu
Pré-Publication, Document De Travail Année : 2019

DSA-aware multiple patterning for the manufacturing of vias: Connections to graph coloring problems, IP formulations, and numerical experiments

Vincent Juliard
  • Fonction : Auteur
Gautier Stauffer
Juan Andres Torres
  • Fonction : Auteur

Résumé

In this paper, we investigate the manufacturing of vias in integrated circuits with a new technology combining lithography and Directed Self Assembly (DSA). Optimizing the production time and costs in this new process entails minimizing the number of lithography steps, which constitutes a generalization of graph coloring. We develop integer programming formulations for several variants of interest in the industry, and then study the computational performance of our formulations on true industrial instances. We show that the best integer programming formulation achieves good computational performance, and indicate potential directions to further speed-up computational time and develop exact approaches feasible for production.

Dates et versions

hal-02148030 , version 1 (05-06-2019)

Identifiants

Citer

Dehia Ait-Ferhat, Vincent Juliard, Gautier Stauffer, Juan Andres Torres. DSA-aware multiple patterning for the manufacturing of vias: Connections to graph coloring problems, IP formulations, and numerical experiments. 2019. ⟨hal-02148030⟩
18 Consultations
0 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More