A robust ALD-protected silicon-based hybrid photoelectrode for hydrogen evolution under aqueous conditions - Archive ouverte HAL
Article Dans Une Revue Chemical Science Année : 2019

A robust ALD-protected silicon-based hybrid photoelectrode for hydrogen evolution under aqueous conditions

Résumé

Hydrogen production through direct sunlight-driven water splitting in photo-electrochemical cells (PECs) is a promising solution for energy sourcing. PECs need to fulfill three criteria: sustainability, cost-effectiveness and stability. Here we report an efficient and stable photocathode platform for H2 evolution based on Earth-abundant elements. A p-type silicon surface was protected by atomic layer deposition (ALD) with a 15 nm TiO2 layer, on top of which a 300 nm mesoporous TiO2 layer was spin-coated. The cobalt diimine-dioxime molecular catalyst was covalently grafted onto TiO2 through phosphonate anchors and an additional 0.2 nm ALD-TiO2 layer was applied for stabilization. This assembly catalyzes water reduction into H2 in phosphate buffer (pH 7) with an onset potential of +0.47 V vs. RHE. The resulting current density is -1.3 ± 0.1 mA cm-2 at 0 V vs. RHE under AM 1.5 solar irradiation, corresponding to a turnover number of 260 per hour of operation and a turnover frequency of 0.071 s-1.

Domaines

Matériaux Catalyse
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Dates et versions

hal-02122815 , version 1 (07-07-2021)

Identifiants

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Soundarrajan Chandrasekaran, Nicolas Kaeffer, Laurent Cagnon, Dmitry Aldakov, Jennifer Fize, et al.. A robust ALD-protected silicon-based hybrid photoelectrode for hydrogen evolution under aqueous conditions. Chemical Science, 2019, 10 (16), pp.4469-4475. ⟨10.1039/C8SC05006F⟩. ⟨hal-02122815⟩
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