Te homogeneous precipitation in Ge dislocation loop vicinity - Archive ouverte HAL
Article Dans Une Revue Applied Physics Letters Année : 2016

Te homogeneous precipitation in Ge dislocation loop vicinity

Résumé

High resolution microscopies were used to study the interactions of Te atoms with Ge dislocation loops, after a standard n-type doping process in Ge. Te atoms neither segregate nor precipitate on dislocation loops, but form Te-Ge clusters at the same depth as dislocation loops, in contradiction with usual dopant behavior and thermodynamic expectations. Atomistic kinetic Monte Carlo simulations show that Te atoms are repulsed from dislocation loops due to elastic interactions, promoting homogeneous Te-Ge nucleation between dislocation loops. This phenomenon is enhanced by coulombic interactions between activated Te2þ or Te1þ ions.
Fichier principal
Vignette du fichier
Appl. Phys. Lett (2016).pdf (1.62 Mo) Télécharger le fichier
Origine Fichiers éditeurs autorisés sur une archive ouverte
Loading...

Dates et versions

hal-02111623 , version 1 (26-04-2019)

Identifiants

  • HAL Id : hal-02111623 , version 1

Citer

J Perrin Toinin, A. Portavoce, M. Texier, M. Bertoglio, K. Hoummada. Te homogeneous precipitation in Ge dislocation loop vicinity. Applied Physics Letters, 2016, 108. ⟨hal-02111623⟩
23 Consultations
85 Téléchargements

Partager

More