Redistribution of Metallic Impurities in Si during Annealing and Oxidation: W and Fe - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Defect and Diffusion Forum Année : 2018

Redistribution of Metallic Impurities in Si during Annealing and Oxidation: W and Fe

Résumé

Atomic redistribution of W and Fe in Si were studied using secondary ion mass spectrometry and transmission electron microscopy. W diffusion experiments performed during isothermal annealing and during Si oxidation show that W atoms should use at least two different diffusion mechanisms. Experimental diffusion profiles can be well simulated by considering the simultaneous use of three different W diffusion mechanisms: the dissociative and the kick-out mechanisms, as well as an original mechanism based on the formation of a W-Si self-interstitial pair located on the interstitial Si sub-lattice. Fe redistribution was studied during the oxidation of a Fe-contaminated Si wafer. Fe is shown to be first pushed-out in Si by the mobile SiO 2 /Si interface, and thus to form Fe silicides at this interface. The silicide precipitates, which can exhibit a core-shell structure, appear to move with the SiO 2 /Si interface thanks to an oxidation/dissolution mechanism in the SiO 2 and a nucleation/growth mechanism in the Si matrix. Furthermore, the rate difference between Si and Fe silicide precipitate oxidation leads to the formation of Si pyramidal defects at the SiO 2 /Si interface.
Fichier principal
Vignette du fichier
Defect and Diffusion Forum_383, 17 (2018).pdf (927.21 Ko) Télécharger le fichier
Origine : Fichiers produits par l'(les) auteur(s)
Loading...

Dates et versions

hal-02111609 , version 1 (26-04-2019)

Identifiants

Citer

Alain Portavoce, Anthony de Luca, Nelly Burle, Michael Texier. Redistribution of Metallic Impurities in Si during Annealing and Oxidation: W and Fe. Defect and Diffusion Forum, 2018, 383, pp.17-22. ⟨10.4028/www.scientific.net/DDF.383.17⟩. ⟨hal-02111609⟩
50 Consultations
172 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More